| Power supply | AC220V,50Hz | |
| Whole power | 6KW | |
| Ultimate vacuum | 5x10-4Pa | |
| Sample table parameters | Size | φ150mm |
| Heat temp | 500℃ max. | |
| Temp control | ±1℃ | |
| Rotation speed | 1-20rpm adjustable | |
| Magnetron sputtering head parameters | Quantity | Size:2 inches x2 |
| Cooling mode | Water cooled, flow 10L/min required | |
| Water chiller | 10L/min circulating water cooling | |
| Vacuum chamber | Size | φ300mm x 340mm H |
| Material | SUS | |
| Watch window | φ100mm | |
| Opening mode | open type, easy to replace target | |
| Gas flow controller | One-channel,200sccm Ar; | |
| Vacuum pump | A molecular pump system, pumping 600L/S | |
| Quartz vibrating film thickness gauge | One set, resolution 0.10 angstrom | |
| Sputter power source | DC power supply:500W x2, Suitable for preparing metal films | |
| Operating mode | All-in-one computer operation | |
| Overall Dimensions | 1090mm x 900mm x 1250mm | |
| Total weight | 350kg | |