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Multi arc ion coating equipment

Multi-arc ion plating is the use of gas discharge or partial ionization of evaporated substances, while gas ions or particles of evaporated substances are bombarded, the evaporated substances or reactants are deposited on the substrate. Ion plating combines the glow discharge, plasma technology and
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Multi-arc ion plating is the use of gas discharge or partial ionization of evaporated substances, while gas ions or particles of evaporated substances are bombarded, the evaporated substances or reactants are deposited on the substrate. Ion plating combines the glow discharge, plasma technology and vacuum evaporation organically, which not only significantly improves the film quality, but also expands the application range of the film. It has the advantages of fast evaporation rate, strong film adhesion, good diffraction, and extensive film materials. It is very suitable for plating hard protective film such as TiN. At the same time, because it can change the color of the film by controlling the atmosphere, and the film is firmly combined with the substrate, it can also be used to make decorative films of various colors.
Features of multi arc ion coating equipment
This equipment is equipped with two multi-arc targets, which are placed on both sides of the chamber. Cooperating with the planetary sample stage can effectively improve the coating efficiency and improve the effect.
The coating instrument also adopts an integrated design, the chamber and the electric control part are separated on the left and right, which realizes the separation of water and electricity, and effectively guarantees the safety of users.


Technical parameters of multi arc ion coating equipment:
 Model HS-MIOP500S-2TA
 Vacuum chamber

Water cooled stainless steel chamber;

φ500mm x 490mmH;

Front door type, φ 100 mm quartz observation window;

Built in two sets of infrared heating lamps, can be used for baking and degassing the chamber;

Multiple CF interfaces are reserved for installation of multi-channel film thickness meter

 Gas system

Mass flow meter: Ar gas 0~200sccm, N2 gas 0~200sccm

 other flow or gas can be customized

 Power supply AC 220V;50Hz;10kW
 Control system 15" touch screen configuration control software
 Multi arc target Quantity and SPEC 2-set;3inches
Installation method Chamber side, opposite
Working current 0~150A
Target thickness 50mm, Min. 20mm
 Sample stage Specification Planetary hanger
Number of samples There are 6 hanging points on each hanger, totally 6 hangers
Rotation speed Revolution speed 1~20rpm
 Vacuum system Model HS-GZK103-A
Molecular pump Turbo molecular pump
Backing pump Double stage rotary vane pump
Pumping molecular pump: 6000L/S Comprehensive   pumping performance: 30 minutes vacuum degree up to: 5×10E-3Pa
Rotary vane pump: 1.1L/S
Ultimate vacuum 5×10E-4Pa
Extraction interface KF40
Exhaust interface KF16
Vacuum measurement Composite vacuum gauge
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