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Programmable single chamber magnetron sputtering coater

Programmable single chamber magnetron sputtering coater is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, insta
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Programmable single chamber magnetron sputtering coater is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system,etc.

The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.


Programmable single chamber magnetron sputtering coater

 Sputtering chamber vacuum limit≤8.0×10-6Pa
 Vacuum recovery timeThe system was pumped from atmosphere to 1.0×10-3 Pa within 15minutes
 UniformityFilm thickness nonuniformity≤±5%; nonuniformity between the slices≤±5%; Inhomogeneity between batches≤±5%
 Sputtering vacuum chamberThe cylindrical structure, size 800mmx250mm
 Magnetron sputtering system

Permanent magnet target 4, target size 6 inches;

One imported power supply (rf or dc pulse optional);

Sputtering rate: 0.5 ~ 5 angstrom per second (target Al)

 Revolution base plate

6 inches 6 pieces (4 inches 12 pieces or 3 inches 16 pieces);

The substrate revolution is 3~15 revolution/min, continuously adjustable, and the common rotation composite worktable is optional

 Light heating system

Sample heating temperature: room   temperature to 250 ℃, continuous adjustable;

Substrate temperature nonuniformity: ≤±10℃;

Temperature control method is PID   automatic temperature control and digital display, equipped with imported temperature control meter.

 Working gas channel2 channel mass flow controller (MFC)
 Gas pump compositionCryopump (imported), Roots dry pump set, air gate valve (imported), pipes
 Vacuum measurementSystem vacuum, working vacuum and backing vacuum was precisely measured by 2 vacuum gauges (imported); the vacuum degree can be displayed visually on the touch screen of industrial computer; the vacuum degree of the sputtering coating process can be monitored accurately.
 Control systemThe entire system can be controlled by IPC (touch screen) and PLC (imported)
 Floor SpaceMain set1500×1000mm2
electric control cabinet700×700mm2(one)

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