Welcome to HANSUN ELECTRIC TECHNOLOGY CO., LIMITED
CALL TO SCHEDULE YOUR FREE!
0086-13837108448
info@hansunhk.com

Dual chamber pulse laser coater

Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is wi
Products Inquiry

Product Details

Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

Dual chamber pulse laser coater specifications:
 Main vacuum system Sphere structure, size: dia. 450mm
 Loading sample system Vertical cylindrical stucture, size: dia. 150×150mm
 Vacuum system configuration Main vacuum chamber Mechanical pump, molecular pump, valve
Loading sample system Mechanical pump and molecular pump(sharing with primary chamber), valve
 Ultimate pressure Main vacuum system ≤6*10-6Pa(after baking and degassing)
Loading sample system ≤6*10-3 Pa(after baking and degassing)
 Vacuum recovery  system Main vacuum system It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)
Loading sample   system It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)
 Rotating target platform The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm
 Substrate heating platform Sample size Dia. 51
Mode of motion Substrate rotates continuously, rotation speed:5-60 rpm
Heating temperature Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable
 Gas circuit system 1-circuit mass flow controller, 1-circuit inflation valve
 Optional accessories Laser device Compatible with coherent 201 laser
Laser beam scanning device 2D scanning mechanical platform, perform two degree of freedom scanning.
Computer control system The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc.
 Floor Space Main unit 1800 * 1800mm2
Electric cabinet 700 *700mm2(one)
Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will improve and modify any information on the website from time to time without prior notice.