Main vacuum system |
Sphere structure, size: dia. 450mm |
Loading sample system |
Vertical cylindrical stucture, size: dia. 150×150mm |
Vacuum system configuration |
Main vacuum chamber |
Mechanical pump, molecular pump, valve |
Loading sample system |
Mechanical pump and molecular pump(sharing with primary chamber), valve |
Ultimate pressure |
Main vacuum system |
≤6*10-6Pa(after baking and degassing) |
Loading sample system |
≤6*10-3 Pa(after baking and degassing) |
Vacuum recovery system |
Main vacuum system |
It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Loading sample system |
It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Rotating target platform |
The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm |
Substrate heating platform |
Sample size |
Dia. 51 |
Mode of motion |
Substrate rotates continuously, rotation speed:5-60 rpm |
Heating temperature |
Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable |
Gas circuit system |
1-circuit mass flow controller, 1-circuit inflation valve |
Optional accessories |
Laser device |
Compatible with coherent 201 laser |
Laser beam scanning device |
2D scanning mechanical platform, perform two degree of freedom scanning. |
Computer control system |
The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. |
Floor Space |
Main unit |
1800 * 1800mm2 |
Electric cabinet |
700 *700mm2(one) |