Welcome to HANSUN ELECTRIC TECHNOLOGY CO., LIMITED
CALL TO SCHEDULE YOUR FREE!
0086-13837108448
info@hansunhk.com

Three targets magnetron sputtering coater (with DC&RF power supply) HS-MSP300S-2DC1RF

Magnetron sputtering coating equipment is a special laboratory coating machine developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive fi
Products Inquiry

Product Details

Magnetron sputtering coating equipment is a special laboratory coating machine developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.

After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.


Three targets magnetron sputtering coater technical parameters:
 Power supply AC220V,50Hz
 Whole power 6KW
 Ultimate vacuum 5x10-4Pa
 Sample table parameters Size φ150mm
Heat temp 500℃ max.
Temp control ±1℃
Rotation speed 1-20rpm adjustable
 Magnetron sputtering head parameters Quantity Size:2 inches x3
Cooling mode Water cooled, flow 10L/min required
Water chiller 10L/min Circulating water cooling
 Vacuum chamber Size φ300mm x 340mm H
Material SUS
Watch window φ100mm
Opening mode open type, easy to replace target
 Gas flow controller One-channel,200sccm Ar;
 Vacuum pump A molecular pump system, pumping 600L/S
 Quartz vibrating film thickness gauge One set, resolution 0.10 angstrom
 Sputter power source

DC power supply:500W x2, Suitable for preparing metal films

RF power supply:500W, Suitable for preparing non - metallic films

 Operating mode All-in-one computer operation
 Overall Dimensions 1090mm x 900mm x 1250mm
 Total weight 350kg
Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will periodically improve and modify the website information, without prior notice, please understand.