Power supply | AC220V,50Hz | |
Whole power | 6KW | |
Ultimate vacuum | 5x10-4Pa | |
Sample table parameters | Size | φ150mm |
Heat temp | 500℃ max. | |
Temp control | ±1℃ | |
Rotation speed | 1-20rpm adjustable | |
Magnetron sputtering head parameters | Quantity | Size:2 inches x3 |
Cooling mode | Water cooled, flow 10L/min required | |
Water chiller | 10L/min Circulating water cooling | |
Vacuum chamber | Size | φ300mm x 340mm H |
Material | SUS | |
Watch window | φ100mm | |
Opening mode | open type, easy to replace target | |
Gas flow controller | One-channel,200sccm Ar; | |
Vacuum pump | A molecular pump system, pumping 600L/S | |
Quartz vibrating film thickness gauge | One set, resolution 0.10 angstrom | |
Sputter power source |
DC power supply:500W x2, Suitable for preparing metal films RF power supply:500W, Suitable for preparing non - metallic films |
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Operating mode | All-in-one computer operation | |
Overall Dimensions | 1090mm x 900mm x 1250mm | |
Total weight | 350kg |