Welcome to HANSUN ELECTRIC TECHNOLOGY CO., LIMITED
CALL TO SCHEDULE YOUR FREE!
0086-13837108448
info@hansunhk.com

Magnetron sputtering/vacuum evaporation composite coating equipment HS-MSE300S-DC

The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposi
Products Inquiry

Product Details

The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film. This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film.

The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. 

Magnetron sputtering/vacuum evaporation composite coating equipment application:
The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.


Magnetron sputtering/vacuum evaporation composite coating equipment specifications:
 Product Model Magnetron sputtering/vacuum evaporation composite coating equipment CY-MSE300S-DC
 Sample stage Size Φ185mm
Temperature control accuracy ±1℃
Rotating speed 1-20rpm adjustable
Sputter current 2~20mA
Sputter voltage 1000V
Evaporation source Tungsten wire basket
Maximum temperature 1700℃
Precise temperature control 30-segment lifting and lowering temperature program can be set
 Vacuum chamber Chamber size φ300mm × 300mm
Watch window φ100mm
Chamber material Stainless steel
Opening method Top over open
 Film thickness monitor Monitoring components Power supply DC 5V (±10%), maximum current 400mA
Frequency resolution ±0.03Hz
Film thickness resolution 0.0136Å (aluminum)
Film thickness accuracy ±0.5%, depending on process conditions, especially sensor position, material stress,   temperature and density
Measuring speed 100ms-1s/times, settable
Measuring range 500000Å (aluminum)
Standard sensor crystal 6MHz
Computer interface RS-232/485   serial interface (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set,   data bit: 8, stop bit: 1, check: none)
Analog output 8-bit   resolution, PWM pulse width modulated output (open collector or internal 5V output)
Working environment Temperature 0-50℃, humidity 5%-85% RH, no condensation beads
Displayer Input power AC 220V±10%
Output power DC 5V 3A
Displayer 12×2 digital tube and LED
Communication  port RS-485   (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set, data bit: 8 bits,   stop bit: 1 bit, parity: none)
Probes Applicable wafer frequency 6MHz
Applicable   wafer size Φ14mm
Mounting flange CF35
Cooling water pipe Φ3mm, length 00mm, 500mm, 1000mm
Cooling water pressure <0.3MPa
Pneumatic baffle pipe Φ3mm
Baking temperature Water supply state <200℃, water-free state flange <100℃
Electrical Interface BCN socket
 Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
 Vacuum system Model CY-GZK103-A
Pumping interface KF40
Molecular pump CY-600
Exhaust interface KF16
Backing pump Rotary vane pump
Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa
Power supply AC;220V   50/60Hz
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive pumping performance: The vacuum can reach 1.0E-3Pa in 20 minutes.
 Optional accessories Various targets such as gold, indium, silver, and platinum
 Warranty One year warranty, lifetime technical support.
Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will periodically improve and modify the website information, without prior notice, please understand.