Product Model |
Magnetron sputtering/vacuum evaporation composite coating equipment CY-MSE300S-DC |
Sample stage |
Size |
Φ185mm |
Temperature control accuracy |
±1℃ |
Rotating speed |
1-20rpm adjustable |
Sputter current |
2~20mA |
Sputter voltage |
1000V |
Evaporation source |
Tungsten wire basket |
Maximum temperature |
1700℃ |
Precise temperature control |
30-segment lifting and lowering temperature program can be set |
Vacuum chamber |
Chamber size |
φ300mm × 300mm |
Watch window |
φ100mm |
Chamber material |
Stainless steel |
Opening method |
Top over open |
Film thickness monitor |
Monitoring components |
Power supply |
DC 5V (±10%), maximum current 400mA |
Frequency resolution |
±0.03Hz |
Film thickness resolution |
0.0136Å (aluminum) |
Film thickness accuracy |
±0.5%, depending on process conditions, especially sensor position, material stress, temperature and density |
Measuring speed |
100ms-1s/times, settable |
Measuring range |
500000Å (aluminum) |
Standard sensor crystal |
6MHz |
Computer interface |
RS-232/485 serial interface (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set, data bit: 8, stop bit: 1, check: none) |
Analog output |
8-bit resolution, PWM pulse width modulated output (open collector or internal 5V output) |
Working environment |
Temperature 0-50℃, humidity 5%-85% RH, no condensation beads |
Displayer |
Input power |
AC 220V±10% |
Output power |
DC 5V 3A |
Displayer |
12×2 digital tube and LED |
Communication port |
RS-485 (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set, data bit: 8 bits, stop bit: 1 bit, parity: none) |
Probes |
Applicable wafer frequency |
6MHz |
Applicable wafer size |
Φ14mm |
Mounting flange |
CF35 |
Cooling water pipe |
Φ3mm, length 00mm, 500mm, 1000mm |
Cooling water pressure |
<0.3MPa |
Pneumatic baffle pipe |
Φ3mm |
Baking temperature |
Water supply state <200℃, water-free state flange <100℃ |
Electrical Interface |
BCN socket |
Mass flowmeter |
2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) |
Vacuum system |
Model |
CY-GZK103-A |
Pumping interface |
KF40 |
Molecular pump |
CY-600 |
Exhaust interface |
KF16 |
Backing pump |
Rotary vane pump |
Vacuum measurement |
Compound vacuum gauge |
Ultimate vacuum |
1.0E-5Pa |
Power supply |
AC;220V 50/60Hz |
Pumping rate |
Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive pumping performance: The vacuum can reach 1.0E-3Pa in 20 minutes. |
Optional accessories |
Various targets such as gold, indium, silver, and platinum |
Warranty |
One year warranty, lifetime technical support. |