Vacuum touch screen programmable spin coateris suitable for surface coating processes such as semiconductor, silicon wafer, wafer, substrate, conductive glass and plate making. It can be used in production, scientific research and teaching in industrial and mining enterprises, scientific research, e
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Vacuum touch screen programmable spin coateris suitable for surface coating processes such as semiconductor, silicon wafer, wafer, substrate, conductive glass and plate making. It can be used in production, scientific research and teaching in industrial and mining enterprises, scientific research, education and other units.
Vacuum touch screen programmable spin coater technical parameters: Speed accuracy1RPM
Maximum target speed <5000RPM
Acceleration <5000RPM/S (depending on torque)
Inner chamber vacuuming negative pressure <-0.06MPa
Multi-step operation 10groups of 10 steps
Single step length3000S
Time resolution 0.1S
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