RTP rapid annealing furnace HS-O1000-120I-T-RTP

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Product Details

The tube size of the RTP rapid annealing furnace is 120mm, which can directly place 4 inches of material. The reaction zone of the sample is in a closed quartz chamber, which greatly reduces the possibility of indirect contamination of the sample while completing the production process. The device is equipped with LCD high-definition touch screen, and the setting data experiment operation is all graphic interface. It is convenient and quick to operate, which can greatly improve your experiment efficiency. The equipment has reserved the quick interface for vacuum and air gases, and our vacuum system can be used together with the gas mixing system.
RTP rapid annealing furnace application range:
Rapid annealing furnace equipment can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicidation, diffusion, compound semiconductor annealing, post-ion implantation annealing, electrode alloying, crystallization and densification, alloy melting point analysis, thin film deposition, and the like.

RTP rapid annealing furnace technical parameters:

Model	HS-O1000-120I-T-RTP
Furnace tube material	High purity quartz
Furnace tube diameter	120mm
Furnace tube length	500mm
Furnace chamber length	440mm
Heating zone length	400mm
Constant temperature zone	200mm
Operating temperature	0～500℃
Heating rate	Recommended 80℃/ s, fast heating rate 200℃/s
Cooling speed	More than 200℃≤25 min
Temperature control accuracy	±1℃
Temperature control mode	30 or 50 segment program temperature control
Display mode	LCD touch screen
Sealing method	304 stainless steel vacuum flange
Flange interface	1/4" ferrule connector (Ø8 pagoda-shape connector)
Vacuum	4.4E-3Pa
Power supply	AC:220V 50/60Hz

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