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Single heating zone rotary graphene preparation PECVD furnace

This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and tilting mechanism, a single heating zone tube furnace, a plasma generator, a mass flow meter gas delivery system, and a high vacuum molecular pump unit. Compared with other graphene
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Product Details

This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and tilting mechanism, a single heating zone tube furnace, a plasma generator, a mass flow meter gas delivery system, and a high vacuum molecular pump unit. Compared with other graphene preparation equipment, this equipment can provide a higher background vacuum, which can improve the quality of the product; it can use the rotation and tilt mechanism to achieve continuous production, and can make the surface of the particle sample grow products evenly; the plasma generator can significantly reduce the reaction temperature and improve the reaction efficiency.

Technical parameters:
 Single heating zone tube furnace Product model HS-O1200-100IT
Furnace tube material High purity quartz
Tube diameter 100mm
Furnace tube length 1500mm
Furnace chamber length 440mm
Heating zone length 400mm
Constant temperature zone head 200mm
Operating temperature 0~1100℃
Temperature control accuracy ±1℃
Temperature control mode 30 or 50 segment program temperature   control
Display mode HD full color LCD touch screen
Sealing method 304 stainless steel vacuum flange
Power supply AC: 220V 50/60Hz
 RF output system Power range 0~500W adjustable
working frequency 13.56MHz+0.005%
Working mode Continuous output
Matched impedance mode It can be matched, and the glow is evenly distributed throughout the furnace tube
Power stability ≤2W
Normal working reflected power ≤3W
Amplified reflected power ≤70W
Harmonic component ≤-50dBc
Overall efficiency ≥70%
Power factor ≥90%
Supply voltage/frequency Single-phase AC (187V~153V) frequency   50/60Hz
Control mode Internal control/PLC analog quantity/RS232/485 communication
Power protection settings DC over current protection, power amplifier over temperature protection, reflected power protection
Cooling method Forced air cooling
Glow zone Under Ar, the radio frequency power supply and the coil cooperate with the glow to fill the furnace tube
 Gas delivery system Flowmeter Four-channel mass flowmeter
Flow range

MFC1 range: 0~200sccm MFC2 range: 0~200sccm

MFC3 range: 0~500sccm MFC4 range: 0~500sccm

Corresponding to gases H2, CH4, N2, Ar.

Measurement accuracy ±1.5%F.S
Repeatability ±0.2%FS
Linear accuracy ±1%F.S.
Response time ≤4s
Work pressure -0.15Mpa~0.15Mpa
Flow control LCD touch screen control, digital display, each channel gas contains needle valve for individually control.
Intake interface It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe
Outlet interface It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe
Connection method Double ferrule connector
Operating temperature 5~45℃
Gas premix Equipped with gas premixing device
 Exhaust system Product model HS-GZK103-A
Molecular pump Turbomolecular pump
Backing pump Two-stage rotary vane pump
Pumping rate Molecular pump: 600L/S Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa
Rotary   vane pump: 1.1L/S
Ultimate vacuum 5×10E-4Pa
Pumping port KF40
Exhaust interface KF16
Vacuum measurement Compound vacuum gauge
 Rotating and tilting device Speed range 0-20rpm
Tilt angle 0-15°
Material feeding and receiving system Automatic feeding, automatic collection after tilting
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