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Compact 500W RF Generator with Auto Matching Network for RF Sputtering HS-RF500

RF generator is form a complete set of plasma power supply,it is composed by by the rf power source, impedance matching unit and the impedance of power meterIt is widely used for RF Sputtering, PECVD Chemical Vapor Deposition,and Reactive-ion Etching and etc.Product Name
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RF generator is  form a complete set of plasma power supply,it is composed by by the rf power source, impedance matching unit and the impedance of power meter
It is widely used for RF Sputtering, PECVD Chemical Vapor Deposition,and Reactive-ion Etching and etc.
 Product Name RF Generator
 RF power 13.56MHz±0.005%
 Output Power Range 0-500w, adjustable
 Working mode Continuous output
 Display LCD
 RF output Impedance N-type, female,50Ω
 Power stability ≤2w
 Maximum reflection power 200w
 Componentes armonicos <-50dBc
 Response time 200ms
 Control Mode PLC/RS232/485
 Tube Diameter Φ50,60,80,100mm
 Cooling method Forced air cooling
 Dimension 380*320*450mm
 Gross weight 30kg