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Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-HS-O1200-50IC-3F

FurnaceparametersFurnaceConstruction•Highpurityceramicfiberinsulation(energysaving30%andweightlighterabout30%thanol···

Features1.PC and PID Programmable control, easy operation2.Over pressure &over temperature protective, make sure user···

Features1.Fast heating and cooling, maximum rate: 0-100°c/min2.Multi-function: CVD experiment, growth of graphene, c···

It is suitable for the production of micro-particulate powder in laboratory of universities, research institutes and foo···

This equipment is customized plasma testing equipment for customers. The main component of the equipment is an inductive···

This proportioner is suitable for low pressure and small flow, multiple gas single/mixed continuous gas supply systems. ···

In this product, besides the static contact angle measured by stop-drop method, the dynamic contact angle (including for···

Basic InfoModel NO.: HS-CM-SS316Material: Stainless SteelStructure: Single TubeAgitator Model: Paddle AgitatorHeating: E···