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10L 13.56MHz Plasma Cleaner

Technical parmatersPower supply:AC220VWorking current:Total working current not higher than1.2A (Not include the vacuum ···

5L Plasma Cleaner

Technical parmatersPower supply:AC220VWorking current:Total working current not higher than1.2A (Not include the vacuum ···

Plasma Cleaner

Technical parmatersPower supply:AC220VWorking current:Total working current not higher than1.2A (Not include the vacuum ···

Plasma Cleaning Machine

Model No.HS-P2LProduct Name2L Plasma CleanerDisplayLCD touch controllerWorking voltageAC 220V, 50HzRF Frequency40KHz (13···

Desktop double head magnetron sputtering coating machine

This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films···

Dual target upper sputtering DC RF magnetron sputtering coating machine

HS-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. It is equipped with···

Dual target magnetron sputtering coater with reciprocating sample stage

HS-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our compa···

Dual target magnetron sputtering and thermal evaporation composite coating machine

HS-MS500S-2TA1S magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electr···