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Dual target magnetron sputtering coater with reciprocating sample stage

HS-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, al
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HS-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Features of magnetron sputtering coater:
a. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering.
b. The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time.
c. The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right.

d. The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films

Technical parameters of magnetron sputtering coater:
 Model HS-MSP500S-DCRF-RE
 Input AC220V,50Hz
 Total power 6KW
 Ultimate vacuum degree 5x10-4Pa
 Sample table parameters Size 100mm x 100mm
Reciprocating stroke 200mm
 Magnetron sputtering head parameters Quantity 2-set, 2-inch
Cooling mode Water cooled, required flow rate10L/min
Water chiller 10L/min circulating water cooling
 Vacuum chamber Size φ500mm x 490mm H
Material Stainless steel
Watch window φ100mm
Open mode front opening door
 Gas flow controller 1channel 200sccm Ar;
 Vacuum pump  Molecular pump system pumping 600L/S
 Film thickness gauge Quartz vibrating film thickness gauge, one set, Resolution 0.10 Å
 Sputter power supply DC power supply: one set, 500W, for preparing metal films
RF power supply: one set, 500W, for non - metallic coating
 Operating modeAll-in-one computer operation All-in-one computer operation
 Overall dimensions 1090mm x 900mm x 1250mm
 Total weight 350kg

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