Wafer level large-size molybdenum disulfide preparation furnace

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Product Details

This equipment is a wafer level large-size molybdenum disulfide preparation device designed based on CVD principles. It includes a three-zone tube furnace, a specially designed furnace tube and a set of supporting gas paths. The equipment can uniformly release the reaction gas into the furnace tube through a specially designed pipeline to ensure the consistency and uniformity of the product on the back-end wafer. It is the best choice for molybdenum disulfide preparation experiments.

Technical parameters:

Product model	HS-O1200-120III-IC-3Z-MoS2
Furnace tube material	High purity quartz
Furnace tube size	External large quartz tube φ120mm x1000mm Internal small quartz tube φ25mm x820mm x7
Temperature zone length	Three heating zone 200mm+200mm+200mm
Temperature control accuracy	±1℃
Temperature curve	Independent temperature control in three temperature zones, each temperature zone can be set with 30-segment time temperature curve
Operating temperature	0~1150℃
Heating rate	≤10℃/min
Intake system	Three-channel mass flow meter Ar gas 0~500sccm N2 gas 0~200sccm H2 gas 0~200sccm Equipped with seven channels of gas separation, gas mixing gas path.
Furnace pipe flange	Stainless steel water-cooled flange, equipped with KF16 vacuum interface, mechanical vacuum gauge and stainless steel needle valve
Power requirements	AC 220V 50Hz 4kW
Control mode	7-inch touch screen
Vacuum pump	Dual stage rotary vane vacuum pump
Vacuum	Theoretical ultimate vacuum degree 10^-1Pa

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