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PE-HPCVD (Plasma Enhanced Hybrid Physical Chemical Vapor Deposition) tube furnace

This product is a 1200℃ plasma enhanced hybrid physical chemical vapor deposition (HPCVD) dual heating zone rotary tube ···

Single heating zone rotary graphene preparation PECVD furnace

This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and ti···

MPCVD single crystal diamond deposition equipment

Features:a. Stainless steel cavity type 6kw microwave plasma equipment, high power density;b. The water-cooled substrate···

PECVD Plasma enhanced chemical vapor deposition coating equipment

HS-PECVD-450 film coating machine adopts plasma enhanced chemical vapor deposition technology, which can use high-energy···

Single heating zone rotary PECVD graphene preparation tube furnace

Single heating zone rotary PECVD, equipped with vacuum automatic feeder, and KF40 interface reserved at the end of the f···

PECVD tube furnace with roll to roll system

The instrument is a plasma enhanced chemical vapor deposition device (PECVD) equipped with a roll-to-roll movement syste···

1200℃ high-vacuum rapid annealing furnace

The 1200℃ rapid annealing furnace is essentially a set of sliding tube furnace, which realizes the functions of heating ···

Two-dimensional molybdenum sulfide growth equipment

The two-dimensional material growth device is composed of a preheating furnace, a reaction furnace, a vacuum system, a g···