1200℃ single heating zone low vacuum CVD system with 3-channel float flowmeter to supply gas HS-O1200-50IT-3F-LV

1200℃ single heating zone low vacuum CVD system consists of a single heating zone tube furnace, a three-channel float fl···

Plasma Enhanced CVD system HS-PECVD-T01

In order for the chemical reaction to take place at a lower temperature, the activity of the plasma is utilized to promo···

The three temperature zones of the tube furnace are independently temperature controlled by the precision temperature co···

The two furnace bodies can slide on the slide rails to achieve evaporation/sublimation of the raw materials and film dep···

This equipment is a wafer level large-size molybdenum disulfide preparation device designed based on CVD principles. It ···

This set CVD equipment is a miniaturized CVD system, the core of which is a mini tube furnace, which uses resistance wir···

This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-pre···

HS-O1200-100IIIT-R is a three-zone rotary tube furnace with a feeder and a receiving tank. The feeder can feed the powde···